2019年8月22日星期四

Local electronic transport through InAs/InP(0 0 1) quantum dots capped with a thin InP layer studied by an AFM conductive probe

An AFM combined with a SEM has been used to study the topography and the local electronic transport through InAs QDs grown by metalorganic vapour phase epitaxy (MOVPE) on an n-type InP(0 0 1) substrate and covered by a 5 nm thick InP cap-layer. Images reveal that elliptic terrace-like structures have been formed around the QDs and that the height of the QDs has been decreased to that of the cap-layer. The electric current is very high on the dots, about ten times less on the terraces, and not detectable on the wetting layer. Mechanisms of electronic transport through the sample are discussed, based on current–voltage characteristics and energy band diagrams. The detection of the electron beam induced current (EBIC) with the conductive probe shows that the minority carrier diffusion length, the holes in our case, is about two times larger than that of the reference sample containing no QDs. Mechanisms of charge trapping inside the QDs and the surrounding terraces in forward bias conditions are also discussed. A temporary memory effect is evidenced.


Source:IOPscience

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2019年8月9日星期五

An experimental investigation of Zn diffusion into InP and InGaAs

In this report, we investigate the profiles of zinc (Zn) in n-type InP 100 single crystal wafers and InGaAs epitaxial film prepared by semi-closed ampoule Zn diffusion. The different annealing effect on junction depth and concentration for InP and InGaAs is studied, and the difference is tentatively ascribed to solubility for each material. The maximum net acceptor concentration in InP changes from 3.3 × 1017 cm−3 to 3.3 × 1018 cm−3 before and after annealing, and the later value is close to the solubility limit for closed-ampoule Zn diffusion InP. Annealing does not make the maximum net acceptor concentration and depth in InGaAs change much. Our experiments show that Zn diffusion InGaAs can be used as a good ohmic contact material for photoelectric devices due to its high acceptor concentration.


Source:IOPscience

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2019年8月1日星期四

Improved InAsP metamorphic layers grown on an InP substrate using underlying InP grown at low temperatures

The use of an InP epitaxial layer grown at low temperatures before the growth of a step-graded InAsP metamorphic buffer has been shown to provide a large improvement in the crystal quality of the final metamorphic layer. The improvement is evidenced by over an order of magnitude increase in photoluminescence intensity as well as a large reduction of the mosaic spread and the overall tilt of the relaxed layers



Source:IOPscience

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